An Mos capacitor has a P+ polysilicon gate, substrate doping of Nd = 10^16 cm^-3, and gate oxide thickness of tox = 80nm. The breakdown field of the oxide is...
태그: 전자공학, 반도체공학, si, 반도체, 캐패시터, capacitor, semiconductor, electronics, ptype, ntype
동관 두께 질문 k type l m n 약자좀 알려주세요
태그: 동관두께, ktype, ltype, mtype, ntype